19 May 2008 A practical solution to the critical problem of 193 nm reticle haze
Author Affiliations +
Proceedings Volume 7028, Photomask and Next-Generation Lithography Mask Technology XV; 70282G (2008) https://doi.org/10.1117/12.799669
Event: Photomask and NGL Mask Technology XV, 2008, Yokohama, Japan
Abstract
This paper summarizes the dramatic results achieved through the use of novel reticle haze prevention techniques and new equipment which have enabled these results. Near continuous XCDA® purge of reticle pods coupled with integrated pod purifiers resulted in the elimination of reticle haze defects for the usable production life of reticles.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
David L. Halbmaier, David L. Halbmaier, Yasushi Ohyashiki, Yasushi Ohyashiki, Oleg Kishkovich, Oleg Kishkovich, } "A practical solution to the critical problem of 193 nm reticle haze", Proc. SPIE 7028, Photomask and Next-Generation Lithography Mask Technology XV, 70282G (19 May 2008); doi: 10.1117/12.799669; https://doi.org/10.1117/12.799669
PROCEEDINGS
7 PAGES


SHARE
RELATED CONTENT


Back to Top