Paper
29 August 2008 High resolution wavefront measurement of aspheric optics
Author Affiliations +
Abstract
With the recently emerged large volume production of miniature aspheric lenses for a wide range of applications, a new fast fully automatic high resolution wavefront measurement instrument has been developed. The Shack-Hartmann based system with reproducibility better than 0.05 waves is able to measure highly aspheric optics and allows for real time comparison with design data. Integrated advanced analysis tools such as calculation of Zernike coefficients, 2D-Modulation Transfer Function (MTF), Point Spread Function (PSF), Strehl-Ratio and the measurement of effective focal length (EFL) as well as flange focal length (FFL) allow for the direct verification of lens properties and can be used in a development as well as in a production environment.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
I. Erichsen, S. Krey, J. Heinisch, A. Ruprecht, and E. Dumitrescu "High resolution wavefront measurement of aspheric optics", Proc. SPIE 7060, Current Developments in Lens Design and Optical Engineering IX, 70600T (29 August 2008); https://doi.org/10.1117/12.794467
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CITATIONS
Cited by 2 scholarly publications.
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KEYWORDS
Wavefronts

Semiconducting wafers

Wavefront sensors

Sensors

Light sources

Optical testing

Modulation transfer functions

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