Optics optimization in high-resolution imaging module with extended depth of field

Xi Chen; Dmitry Bakin; Changmeng Liu; Nicholas George

doi:10.1117/12.795970

11 September 2008 Optics optimization in high-resolution imaging module with extended depth of field

Xi Chen, Dmitry Bakin, Changmeng Liu, Nicholas George

Proceedings Volume 7061, Novel Optical Systems Design and Optimization XI; 706103 (2008) https://doi.org/10.1117/12.795970
Event: Optical Engineering + Applications, 2008, San Diego, California, United States

Abstract

The standard imaging lens for a high resolution sensor was modified to achieve the extended depth of field (EDoF) from 300 mm to infinity. In the module the raw sensor outputs are digitally processed to obtain high contrast images. The overall module is considered as an integrated computational imaging system (ICIS). The simulation results for illustrative designs with different amount of spherical aberrations are provided and compared. Based on the results of simulations we introduced the limiting value of the PSF Strehl ratio as the integral threshold criteria to be used during EDoF lens optimization. A four-element standard lens was modified within the design constraints to achieve the EDoF performance. Two EDoF designs created with different design methods are presented. The imaging modules were compared in terms of Strehl ratios, limiting resolution, modulation frequencies at 50% contrast, and SNR. The output images were simulated for EDoF modules, passed through the image processing pipeline, and compared against the images obtained with the standard lens module.

Citation Download Citation

Xi Chen, Dmitry Bakin, Changmeng Liu, and Nicholas George "Optics optimization in high-resolution imaging module with extended depth of field", Proc. SPIE 7061, Novel Optical Systems Design and Optimization XI, 706103 (11 September 2008); https://doi.org/10.1117/12.795970

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