12 September 2008 Simultaneous multiple uniform spot generation with micro optics
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Direct laser patterning of various materials is industrially implemented into several micro-system production lines such as inkjet printing, solar cell technology, flat-panel display production and medical engineering. In contrast to applications of single-mode sources, multi-mode lasers can provide very high power. This allows multi channel material processing and thus high operation speed if uniform light fields can be provided. Here within an illumination system is presented based on a high power multi-mode laser source that generates several uniform spots simultaneously without high stability requirements for the incoming laser source. These spots can be generated in various sizes and at various distances and can be located periodically and non-periodically. The concept consists of two beam processing steps: First the beam is homogenized by use of cylindrical micro-optic lens arrays. Secondly anamorphotic telecentric microoptic objectives split the beam into several uniform segments and image the spots onto the working plane. Because of LIMO's unique production technology the lens arrays can be optimized freely. It results in accurate dimensions and uniform intensity distributions for every single illuminated area. Field dimensions are only restricted by the diffraction limit. Applications could be direct material processing as well as mask illumination approaches.
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J. Fruendt, J. Fruendt, M. Jarczynski, M. Jarczynski, T. Mitra, T. Mitra, } "Simultaneous multiple uniform spot generation with micro optics", Proc. SPIE 7062, Laser Beam Shaping IX, 70620S (12 September 2008); doi: 10.1117/12.795010; https://doi.org/10.1117/12.795010

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