Analysis of sensitivity for optical monitoring in runsheet and admittance diagram

Yu-Jen Chen; Cheng-Chung Lee

doi:10.1117/12.794806

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29 August 2008 Analysis of sensitivity for optical monitoring in runsheet and admittance diagram

Yu-Jen Chen; Cheng-Chung Lee

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Proceedings Volume 7067, Advances in Thin-Film Coatings for Optical Applications V; 706706 (2008) https://doi.org/10.1117/12.794806
Event: Optical Engineering + Applications, 2008, San Diego, California, United States

Abstract

The sensitivities of two optical monitoring methods were discussed in monitoring the growth of a thin film on different pre-coatings. One of the monitoring methods, the most popular one, based on the transmittance or reflection shows the monitoring diagram as runsheet. The other one, a new optical monitoring method called "Admittance Real-time Monitoring" (ARM) based on the equivalent optical admittance shows the monitoring diagram as admittance diagram. The sensitivity varies with the growth of the film and deeply affects the precision of optical monitoring. In this investigation, the relationship between sensitivity and pre-coating and the relationship between sensitivity and film thickness were compared in runsheet and admittance diagram.

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Yu-Jen Chen and Cheng-Chung Lee "Analysis of sensitivity for optical monitoring in runsheet and admittance diagram", Proc. SPIE 7067, Advances in Thin-Film Coatings for Optical Applications V, 706706 (29 August 2008); https://doi.org/10.1117/12.794806

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