Paper
29 August 2008 Microstructure- and optic-related characteristics of magnesium oxide thin film
Ming-Chung Liu, Shih-Chin Yang, Cheng-Chung Lee, Shih-Pu Chen, Jung-Yu Li, Yi-Ping Lin
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Abstract
Plasma display panel is one of the most potential flat devices for large-size displays. Magnesium oxide thin films have been used as a protective layer to improve discharge characteristics and the lifetime of panel. So magnesium oxide thin film is worthy to be studied. Magnesium oxide thin films were prepared by e-beam gun evaporation at a substrate temperature of 200°C. Heat annealing treatment and ion assisted deposition effect on thin films were investigated. The relation between these characteristics of films has been studied. The characteristics of the deposited films, including optical properties, crystalline structure, and microstructure were discussed.
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Ming-Chung Liu, Shih-Chin Yang, Cheng-Chung Lee, Shih-Pu Chen, Jung-Yu Li, and Yi-Ping Lin "Microstructure- and optic-related characteristics of magnesium oxide thin film", Proc. SPIE 7067, Advances in Thin-Film Coatings for Optical Applications V, 70670H (29 August 2008); https://doi.org/10.1117/12.794865
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KEYWORDS
Thin films

Annealing

Magnesium

Oxides

Crystals

Heat treatments

Ions

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