29 August 2008 Miniaturized multilayer dielectric coatings using metal masks fabricated by electroforming and photolithography technologies
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Abstract
The Ni films replacing photoresist serve as a mask to selectively deposit optical thin films at a substrate temperature of 300°C by an electron-beam gun evaporation. The photolithograph is used to define the growth of Ni films by an electroforming technique. Mosaic patterns with a width of 20&mgr;m are chosen as an arrangement of red color filters. The red filters are formed of alternate SiO2 and TiO2 layers and the average transmittance of red filters is larger than 90%. The experimental results successfully illustrate that the combinative uses of photolithography, electroforming and electron-beam gun evaporation can make miniaturized multilayer dielectric coatings with high light transmittance in a hot deposition.
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Cheng-Chung Jaing, Cheng-Chung Jaing, Chii-Rong Yang, Chii-Rong Yang, Chun-Ming Chang, Chun-Ming Chang, Yung-Hsin Chang, Yung-Hsin Chang, Chao-Te Lee, Chao-Te Lee, Chine-Nan Hsiao, Chine-Nan Hsiao, } "Miniaturized multilayer dielectric coatings using metal masks fabricated by electroforming and photolithography technologies", Proc. SPIE 7067, Advances in Thin-Film Coatings for Optical Applications V, 70670P (29 August 2008); doi: 10.1117/12.801626; https://doi.org/10.1117/12.801626
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