3 September 2008 Large quartz crystals for high power optical and laser applications
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Abstract
An industrial process was developed to grow quartz crystals for fabrication of large aperture optical components up to 150 mm in diameter with extended transmission range into the shorter UV. The material's transmission degradation was measured in range of wavelengths from 185 nm to 800 nm before and after gradual increase of irradiation up to 30 kGy dose, using an ArF laser and gamma-rays. The absorption coefficient for X-grown material increases from 0.024 cm-1 before irradiation to 0.132 cm-1 after gamma irradiation at 195 nm and from 0.018 to 0.132 at 460 nm, respectively. Absorption coefficient for Z-grown material increases from 0.025 to 0.038 at 195 nm and from 0.022 to 0.032 at 460 nm, respectively. Optical microscopy, interferometry, and Schlieren method were used for inclusion density and optical inhomogeneity evaluation. Virtually no inclusions and low optical inhomogeneity were revealed. Scanning of the samples at 800 nm and 460 nm (test wave) and plotting the extinction coefficients also confirms high optical homogeneity along growth directions.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
V. A. Klipov, "Large quartz crystals for high power optical and laser applications", Proc. SPIE 7070, Optical Technologies for Arming, Safing, Fuzing, and Firing IV, 707008 (3 September 2008); doi: 10.1117/12.811927; https://doi.org/10.1117/12.811927
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