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3 September 2008 Single-layer and multilayer mirrors for current and next-generation light sources
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Current and next-generation light sources, for instance third generation synchrotron sources, FLASH and the future project X-FEL require single-layer and multilayer mirrors with an active optical length of more than one meter. At the GKSS research centre, a new sputtering system for the deposition of single-layer and multilayers has been installed. This new system is able to manufacture mirrors with a maximum deposition length of 1.5m. In this paper we are going to present the first results of this challenging system. The mirror properties are investigated by means of X-ray reflectometry, transmission electron microscopy and interference microscopy. The performance of the mirrors is analyzed, considering X-ray reflectivity, film thickness, micro-roughness and the uniformity of these properties over the whole deposition length. The results will be discussed and compared with former results.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Michael Störmer, Christian Horstmann, Dietrich Häussler, Erdmann Spiecker, Frank Siewert, Frank Scholze, Frank Hertlein, Wolfgang Jäger, and Rüdiger Bormann "Single-layer and multilayer mirrors for current and next-generation light sources", Proc. SPIE 7077, Advances in X-Ray/EUV Optics and Components III, 707705 (3 September 2008);

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