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3 September 2008 Development of adaptive mirror for wavefront correction of hard x-ray nanobeam
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Abstract
We present the development of a phase compensator for wavefront control of X-rays. The optical device is a 150 mm-long total reflection mirror, the shape of which can be curved by adjusting the bias voltages of 36 piezoelectric ceramic plates attached to the mirror. The mirror surface was smoothed and made flat by elastic emission machining. To achieve a high degree of the accuracy in the controllability of a curved line, a Fizeau interferometer is placed in front of the mirror surface to monitor its shape in the experiment. We will apply this device to the optical system for the realization of sub-10-nm hard X-ray focusing.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Takashi Kimura, Soichiro Handa, Hidekazu Mimura, Hirokatsu Yumoto, Daisuke Yamakawa, Satoshi Matsuyama, Yasuhisa Sano, Kenji Tamasaku, Yoshinori Nishino, Makina Yabashi, Tetsuya Ishikawa, and Kazuto Yamauchi "Development of adaptive mirror for wavefront correction of hard x-ray nanobeam", Proc. SPIE 7077, Advances in X-Ray/EUV Optics and Components III, 707709 (3 September 2008); https://doi.org/10.1117/12.796029
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