3 September 2008 Performance of the upgraded LTP-II at the ALS Optical Metrology Laboratory
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Proceedings Volume 7077, Advances in X-Ray/EUV Optics and Components III; 70770A (2008); doi: 10.1117/12.796335
Event: Optical Engineering + Applications, 2008, San Diego, California, United States
The next generation of synchrotrons and free electron laser facilities requires x-ray optical systems with extremely high performance, generally of diffraction limited quality. Fabrication and use of such optics requires adequate, highly accurate metrology and dedicated instrumentation. Previously, we suggested ways to improve the performance of the Long Trace Profiler (LTP), a slope measuring instrument widely used to characterize x-ray optics at long spatial wavelengths. The main way is use of a CCD detector and corresponding technique for calibration of photo-response non-uniformity [J. L. Kirschman, et al., Proceedings of SPIE 6704, 67040J (2007)]. The present work focuses on the performance and characteristics of the upgraded LTP-II at the ALS Optical Metrology Laboratory. This includes a review of the overall aspects of the design, control system, the movement and measurement regimes for the stage, and analysis of the performance by a slope measurement of a highly curved super-quality substrate with less than 0.3 microradian (rms) slope variation.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jonathan L. Kirschman, Edward E. Domning, Wayne R. McKinney, Gregory Y. Morrison, Brian V. Smith, Valeriy V. Yashchuk, "Performance of the upgraded LTP-II at the ALS Optical Metrology Laboratory", Proc. SPIE 7077, Advances in X-Ray/EUV Optics and Components III, 70770A (3 September 2008); doi: 10.1117/12.796335; https://doi.org/10.1117/12.796335




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