3 September 2008 Fabrication of a 400-mm-long mirror for focusing x-ray free-electron lasers to sub-100 nm
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We describe the fabrication of a long mirror for focusing X-ray free electron lasers to nanometer dimension, for the production of high photon density beams. The focusing mirror has an elliptical curved shape with a length of 400 mm and focal length of 550 mm. Electrolytic in-process dressing grinding is used for first-step figuring and elastic emission machining is employed for final figuring and surface smoothing. Figure accuracy with a peak-to-valley height of 2 nm is achieved. A focusing test was performed at BL29XUL of SPring-8 and found the focused beam size to be approximately 75 nm at 15 keV, very similar to the theoretical value.
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Hidekazu Mimura, Hidekazu Mimura, Shinya Morita, Shinya Morita, Takashi Kimura, Takashi Kimura, Daisuke Yamakawa, Daisuke Yamakawa, Weimin Lin, Weimin Lin, Yoshihiro Uehara, Yoshihiro Uehara, Hirokatsu Yumoto, Hirokatsu Yumoto, Satoshi Matsuyama, Satoshi Matsuyama, Yoshinori Nishino, Yoshinori Nishino, Kenji Tamasaku, Kenji Tamasaku, Haruhiko Ohashi, Haruhiko Ohashi, Makina Yabashi, Makina Yabashi, Tetsuya Ishikawa, Tetsuya Ishikawa, Hitoshi Ohmori, Hitoshi Ohmori, Kazuto Yamauchi, Kazuto Yamauchi, } "Fabrication of a 400-mm-long mirror for focusing x-ray free-electron lasers to sub-100 nm", Proc. SPIE 7077, Advances in X-Ray/EUV Optics and Components III, 70770R (3 September 2008); doi: 10.1117/12.795643; https://doi.org/10.1117/12.795643

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