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25 September 2008 Closed field magnetron sputtering: new generation sputtering process for optical coatings
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Abstract
"Closed field" magnetron (CFM) sputtering offers a flexible and high throughput deposition process for optical coatings and thin films. CFM sputtering uses two or more different metal targets to deposit multilayers comprising a wide range of dielectrics, metals and conductive oxides. Moreover, CFM provides a room temperature deposition process with high ion current density, low bias voltage and reactive oxidation in the entire volume around the rotating substrate drum carrier, thereby producing films over a large surface area at high deposition rate with excellent and reproducible optical properties. Machines based on the Closed Field are scaleable to meet a range of batch and in-line size requirements. Typically, thin film thickness control to <±1% is accomplished simply using time, although optical monitoring can be used for more demanding applications. Fine layer thickness control and deposition of graded index layers is also assisted with a specially designed rotating shutter mechanism. This paper presents data on optical properties for CFM deposited optical coatings, including anti-reflection, thermal control filters, graded coatings, narrowband filters as well as conductive transparent oxides such as indium tin oxide and carbide films. Benefits of the CFM sputter process are described.
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D. R. Gibson, I. Brinkley, E. M. Waddell, and J. M. Walls "Closed field magnetron sputtering: new generation sputtering process for optical coatings", Proc. SPIE 7101, Advances in Optical Thin Films III, 710108 (25 September 2008); doi: 10.1117/12.797152; https://doi.org/10.1117/12.797152
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