Plasma ion-assisted deposition with radio frequency powered plasma sources

H. Hagedorn; M. Klosch; H. Reus; A. Zoeller

doi:10.1117/12.797818

25 September 2008 Plasma ion-assisted deposition with radio frequency powered plasma sources

H. Hagedorn, M. Klosch, H. Reus, A. Zoeller

Proceedings Volume 7101, Advances in Optical Thin Films III; 710109 (2008) https://doi.org/10.1117/12.797818
Event: Optical Systems Design, 2008, Glasgow, Scotland, United Kingdom

Abstract

The deposition of oxide coatings with excellent optical and mechanical properties requires powerful plasma or ion sources. We investigated the layer performance of oxide coatings using a large aperture radio frequency powered plasma source for plasma ion assisted application and related the achieved coating performance to beam parameter of the source. The coatings exhibit low compressive stress values, high refractive indices and low absorption values. Using the new type of source in combination with direct optical monitoring on the dome for the production of challenging interference filters shows a huge potential in terms of stability, running costs and easy maintenance. Examples of application in the visible spectral region will be given.

Citation Download Citation

H. Hagedorn, M. Klosch, H. Reus, and A. Zoeller "Plasma ion-assisted deposition with radio frequency powered plasma sources", Proc. SPIE 7101, Advances in Optical Thin Films III, 710109 (25 September 2008); https://doi.org/10.1117/12.797818

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