25 September 2008 Bulk- micromachined dielectric tunable optical filter realized with inductively coupled plasma chemical vapour deposition
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Abstract
We present the characterization of silicon oxide (SiOx) and silicon nitride (SiNx) films deposited by inductively coupled plasma chemical vapour deposition (ICP-CVD) at low temperature (< 100°C). A tunable optical Fabry- Perot (FP) -filter operating at a wavelength around 1.5μm is realized. It is hybridly assembled with two dielectric distributed Bragg reflectors (DBR). One of the DBR- mirrors is intentionally curved using the intrinsic stress inside the films. Our aim is the development of a tunable surface micromachined VCSEL with a curved dielectric mirror. Therefore ICP-CVD with a low deposition temperature is used for SiOx and SiNx films. As a first step the realization of a tunable bulk- mircomachined optical FP- filter is presented. The refractive index, deposition rate, stress and etching rate in buffered hydrofluoric acid (BHF) of thin dielectric films (<500 nm) in dependence on deposition temperature and on gas flow ratio are investigated. The knowledge of the deposition characteristics of the dielectric films is used to realize DBRs with a given curvature that are applied to electrothermally actuated, optical tunable FP- filters. The presented filter has a free spectral range of 29 nm, an insertion loss of 10 dB and a full width half maximum of 0.16 nm.
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Sandro Jatta, Sandro Jatta, Klaus Haberle, Klaus Haberle, Kuldip Singh, Kuldip Singh, Benjamin Koegel, Benjamin Koegel, Hubert Halbritter, Hubert Halbritter, Peter Meissner, Peter Meissner, } "Bulk- micromachined dielectric tunable optical filter realized with inductively coupled plasma chemical vapour deposition", Proc. SPIE 7101, Advances in Optical Thin Films III, 71011D (25 September 2008); doi: 10.1117/12.797755; https://doi.org/10.1117/12.797755
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