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25 September 2008 Dynamic X-ray lithography for blazed diffractive optics fabrication
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Application of dynamic X-ray lithography for originating of continuous-relief diffractive optical elements and microoptics has been investigated. The method is based on action of X-ray irradiation passed through fixed X-ray mask with triangle-like openings to periodically moved PMMA wafer. PMMA samples were exposed on synchrotron radiation facility VEPP-3 (BINP SB RAS, Novosibirsk) and then etched in liquid developer to form surface relief. Advances and limitations of the method have been discussed. Application of dynamic X-ray lithography with moving wafer to fabrication of gradient diffractive optical elements in PMMA wafer has been demonstrated.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
V. F. Pindyurin, B. G. Goldenberg, E. V. Petrova, U. V. Ancharova, V. S. Eliseev, V. P. Korolkov, and R. K. Nasyrov "Dynamic X-ray lithography for blazed diffractive optics fabrication", Proc. SPIE 7102, Optical Fabrication, Testing, and Metrology III, 710208 (25 September 2008);


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