25 September 2008 Dynamic X-ray lithography for blazed diffractive optics fabrication
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Abstract
Application of dynamic X-ray lithography for originating of continuous-relief diffractive optical elements and microoptics has been investigated. The method is based on action of X-ray irradiation passed through fixed X-ray mask with triangle-like openings to periodically moved PMMA wafer. PMMA samples were exposed on synchrotron radiation facility VEPP-3 (BINP SB RAS, Novosibirsk) and then etched in liquid developer to form surface relief. Advances and limitations of the method have been discussed. Application of dynamic X-ray lithography with moving wafer to fabrication of gradient diffractive optical elements in PMMA wafer has been demonstrated.
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V. F. Pindyurin, V. F. Pindyurin, B. G. Goldenberg, B. G. Goldenberg, E. V. Petrova, E. V. Petrova, U. V. Ancharova, U. V. Ancharova, V. S. Eliseev, V. S. Eliseev, V. P. Korolkov, V. P. Korolkov, R. K. Nasyrov, R. K. Nasyrov, } "Dynamic X-ray lithography for blazed diffractive optics fabrication", Proc. SPIE 7102, Optical Fabrication, Testing, and Metrology III, 710208 (25 September 2008); doi: 10.1117/12.797728; https://doi.org/10.1117/12.797728
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