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17 October 2008 Mask industry assessment: 2008
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Microelectronics industry leaders routinely name the cost and cycle time of mask technology and mask supply as top critical issues. A survey was created with support from SEMATECH and administered by David Powell Consulting to gather information about the mask industry as an objective assessment of its overall condition. The survey is designed with the input of semiconductor company mask technologists, merchant mask suppliers, and industry equipment makers. This year's assessment is the seventh in the current series of annual reports. With ongoing industry support, the report can be used as a baseline to gain perspective on the technical and business status of the mask and microelectronics industries. The report will continue to serve as a valuable reference to identify the strengths and opportunities of the mask industry. The results will be used to guide future investments pertaining to critical path issues. This year's survey is basically the same as the 2005 through 2007 surveys. Questions are grouped into categories: General Business Profile Information, Data Processing, Yields and Yield Loss Mechanisms, Delivery Times, Returns, and Services. Within each category is a multitude of questions that create a detailed profile of both the business and technical status of the critical mask industry.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Greg Hughes and Henry Yun "Mask industry assessment: 2008", Proc. SPIE 7122, Photomask Technology 2008, 712204 (17 October 2008);


The 2002 to 2010 mask survey trend analysis
Proceedings of SPIE (March 16 2011)
Mask industry assessment trend analysis 2006
Proceedings of SPIE (May 02 2007)
Mask Industry Assessment: 2007
Proceedings of SPIE (October 22 2007)
Mask industry assessment: 2009
Proceedings of SPIE (September 29 2009)
Mask Industry Assessment: 2011
Proceedings of SPIE (October 13 2011)
Mask industry assessment trend analysis
Proceedings of SPIE (May 01 2008)
Mask industry assessment: 2003
Proceedings of SPIE (December 16 2003)

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