17 October 2008 Damage mechanisms and process optimization for photomasks with sub-resolution assist features
Author Affiliations +
Abstract
Sub-Resolution Assist Features (SRAFs) are typically the smallest features on a photomask and amplify many of the challenges in mask manufacturing. During the initial stages of process development, resist feature adhesion is the dominate damage mechanism. Throughout mask fabrication, the influence of inherent material properties and wet processing can eventually delaminate SRAFs. The various mechanisms that cause SRAF damage will be presented systematically. Process optimization steps to address the failure mechanisms will be presented. Data illustrating the improved process window for small features will be included.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
L. Kindt, L. Kindt, E. Gallagher, E. Gallagher, J. Levin, J. Levin, Y. Kodera, Y. Kodera, Y. Okawa, Y. Okawa, Y. Sasaki, Y. Sasaki, } "Damage mechanisms and process optimization for photomasks with sub-resolution assist features", Proc. SPIE 7122, Photomask Technology 2008, 71220I (17 October 2008); doi: 10.1117/12.801568; https://doi.org/10.1117/12.801568
PROCEEDINGS
11 PAGES


SHARE
Back to Top