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17 October 2008 Nanomachining photomask repair of complex patterns
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Abstract
Improvements in repair process, software, and AFM tip technology have brought about an overall 2D shape reconstruction capability to nanomachining that has not been previously imagined. Repair results are shown for various processes to highlight their relative strengths and weaknesses. The impact of technical improvements is shown in the advances in repair dimensional precision and overall imaging performance. The greater technical potential of nanomachining is realized in this examination for mask repair scaled to smaller repair geometries while repairing larger defects that may span these critical patterns.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Tod Robinson, Andrew Dinsdale, Mike Archuletta, Ron Bozak, and Roy White "Nanomachining photomask repair of complex patterns", Proc. SPIE 7122, Photomask Technology 2008, 71221I (17 October 2008); https://doi.org/10.1117/12.801297
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