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17 October 2008 Advanced process capabilities for electron beam based photomask repair in a production environment
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Abstract
The cost and time associated with the production of photolithographic masks continues to grow, driven by the ever decreasing feature size, advanced mask technologies and complex resolution enhancing techniques. Thus employment of a high-resolution, comprehensive mask repair tool becomes a key element for a successful production line. The MeRiT® utilizes electron beam induced chemistry to repair both clear and opaque defects on a variety of masks and materials with the highest available resolution and edge placement precision. This paper describes the benefits of the electron beam induced technique as employed by the MeRiT® system for a production environment.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Anthony Garetto, Christof Baur, Jens Oster, Markus Waiblinger, and Klaus Edinger "Advanced process capabilities for electron beam based photomask repair in a production environment", Proc. SPIE 7122, Photomask Technology 2008, 71221K (17 October 2008); https://doi.org/10.1117/12.801554
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