Fast and accurate hybrid subgrid and subcell finite-difference time-domain methods for the simulation of mask electromagnetic effects in sub-45nm lithography

Michael S. Yeung

doi:10.1117/12.801351

17 October 2008 Fast and accurate hybrid subgrid and subcell finite-difference time-domain methods for the simulation of mask electromagnetic effects in sub-45nm lithography

Michael S. Yeung

Author Affiliations +

Proceedings Volume 7122, Photomask Technology 2008; 71221T (2008) https://doi.org/10.1117/12.801351
Event: SPIE Photomask Technology, 2008, Monterey, California, United States

Abstract

Subgrid and subcell FDTD (S-FDTD) methods are described. They can be used for the fast and accurate simulation of mask electromagnetic effects in sub-45nm lithography. The accuracies of the S-FDTD methods are verified by comparison with FDTD and with a very accurate pseudospectral reference solution. The S-FDTD methods are an order of magnitude or more faster than FDTD. Furthermore, the S-FDTD methods require much less memory than FDTD for time marching. Hence, much larger mask areas can be simulated with S-FDTD than with FDTD.

Citation Download Citation

Michael S. Yeung "Fast and accurate hybrid subgrid and subcell finite-difference time-domain methods for the simulation of mask electromagnetic effects in sub-45nm lithography", Proc. SPIE 7122, Photomask Technology 2008, 71221T (17 October 2008); https://doi.org/10.1117/12.801351

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