Study of EUVL mask defect repair using FIB-GAE method

Tsuyoshi Amano; Yasushi Nishiyama; Hiroyuki Shigemura; Tsuneo Terasawa; Osamu Suga; Kensuke Shiina; Fumio Aramaki; Ryoji Hagiwara; Anto Yasaka

doi:10.1117/12.801214

17 October 2008 Study of EUVL mask defect repair using FIB-GAE method

Tsuyoshi Amano, Yasushi Nishiyama, Hiroyuki Shigemura, Tsuneo Terasawa, Osamu Suga, Kensuke Shiina, Fumio Aramaki, Ryoji Hagiwara, Anto Yasaka

Author Affiliations +

Proceedings Volume 7122, Photomask Technology 2008; 71222H (2008) https://doi.org/10.1117/12.801214
Event: SPIE Photomask Technology, 2008, Monterey, California, United States

Abstract

We evaluated a new FIB-GAE (Focused Ion Beam-Gas Assisted Etching) repairing process for the absorber defects on EUVL mask. XeF₂ gas and H₂O gas were used as etching assist agent and etching stop agent respectively. The H₂O gas was used to oxidize Ta-nitride side-wall and to inactivate the remaining XeF₂ gas after the completion of defect repair. At the Photomask Japan 2008 we had reported that side-etching of Ta-nitride caused CD degradation in EUVL. In the present paper we report on the performance of defect repair by FIB, and of printability using SFET (Small Field Exposure Tool). The samples evaluated, were in form of bridge defects in hp225nm L/S pattern. The cross sectional SEM images certified that the newly developed H₂O gas process prevented side-etching damage to TaBN layer and made the side-wall close to vertical. The printability also showed excellent results. There were no significant CD changes in the defocus characterization of the defect repaired region. In its defect repair process, the FIB method showed no signs of scan damage on Cr buffered EUV mask. The repair accuracy and the application to narrow pitched pattern are also discussed.

Citation Download Citation

Tsuyoshi Amano, Yasushi Nishiyama, Hiroyuki Shigemura, Tsuneo Terasawa, Osamu Suga, Kensuke Shiina, Fumio Aramaki, Ryoji Hagiwara, and Anto Yasaka "Study of EUVL mask defect repair using FIB-GAE method", Proc. SPIE 7122, Photomask Technology 2008, 71222H (17 October 2008); https://doi.org/10.1117/12.801214

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