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17 October 2008 International photomask linewidth comparison by NIST and PTB
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Abstract
In preparation of the international Nano1 linewidth comparison on photomasks between 9 national metrology institutes, NIST and PTB have started a bilateral linewidth comparison in 2008, independent of and prior to the Nano1 comparison in order to test the suitability of the mask standards and the general approach to be used for the Nano1 comparison. This contribution describes the rationale of both comparisons, the design of the mask comparison standards to be used and the measurement methods applied for traceable photomask linewidth metrology at NIST and PTB.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
J. Potzick, R. Dixson, R. Quintanilha, M. Stocker, A. Vladar, E. Buhr, W. Häßler-Grohne, B. Bodermann, C. G. Frase, and H. Bosse "International photomask linewidth comparison by NIST and PTB", Proc. SPIE 7122, Photomask Technology 2008, 71222P (17 October 2008); https://doi.org/10.1117/12.801435
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