17 October 2008 Mask data prioritization based on design intent
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Abstract
MaskD2I and STARC have been working together to build efficient data flow based on the information transition from the design to the manufacturing level. By converting design level information called as "Design Intent" to the priority information of mask manufacturing data called as "Mask Data Rank (MDR)", MDP or manufacturing process based on the importance of reticle patterns is possible. Our main purpose is to build a novel data flow with the priority information of mask patterns extracted from the design intent. In EMCL2008, we introduced the idea of MDR and showed its potential effectiveness. Then we addressed an additional idea called DIF(Design Intent File) instead of RAF (Rank Assign File) in PMJ2008. Since DIF contains all the coordinate information necessary for mask data prioritization, it has been proved that mask engineers do not need to access the design information any more. Recently the necessity of information linkage between mask processes and wafer processes has been pointed out and we have started to build a new flow to share the mask data priority information. In this presentation, we will address two new progresses of MaskD2I. One is a new rank assignment method to inspection tools and the other is information feed forward to wafer process.
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Kokoro Kato, Kokoro Kato, Masakazu Endo, Masakazu Endo, Tadao Inoue, Tadao Inoue, Masaki Yamabe, Masaki Yamabe, } "Mask data prioritization based on design intent", Proc. SPIE 7122, Photomask Technology 2008, 71223U (17 October 2008); doi: 10.1117/12.801561; https://doi.org/10.1117/12.801561
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