17 October 2008 Empirical study of OPC metrology requirements for 32-nm node logic
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We evaluate the relationship between the number of measurements used to create each data point in an OPC model data set and resulting model quality for target 32-nm logic node applications. Generated data sets will range from singlemeasurement, unfiltered data sets to many-measurement averages based on filtered results. Intermediate measurementcount averages will also be evaluated in an attempt to quantify the tradeoff between raw measurements per data point and resulting model quality. Finally, other variations will also be considered, such as automated versus manual data filtering. The auto-fitted OPC models will be compared to identify metrology recommendations for 32-nm logic node modeling.
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Brian S. Ward, Brian S. Ward, Lena Zavylova, Lena Zavylova, Peter de Bisschop, Peter de Bisschop, Jeroen van de Kerkhove, Jeroen van de Kerkhove, } "Empirical study of OPC metrology requirements for 32-nm node logic", Proc. SPIE 7122, Photomask Technology 2008, 712242 (17 October 2008); doi: 10.1117/12.801458; https://doi.org/10.1117/12.801458

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