Effects of quick thermal oxidation annealing on structure of vanadium oxide thin films by direct current facing targets reactive magentron sputtering

Jiran Liang; Ming Hu; Zhigang Liu

doi:10.1117/12.806466

13 October 2008 Effects of quick thermal oxidation annealing on structure of vanadium oxide thin films by direct current facing targets reactive magentron sputtering

Jiran Liang, Ming Hu, Zhigang Liu

Author Affiliations +

Proceedings Volume 7127, Seventh International Symposium on Instrumentation and Control Technology: Sensors and Instruments, Computer Simulation, and Artificial Intelligence; 712724 (2008) https://doi.org/10.1117/12.806466
Event: Seventh International Symposium on Instrumentation and Control Technology, 2008, Beijing, China

Abstract

Thermochromism vanadium dioxide thin films were fabricated by quick thermal oxidation annealing of direct current facing targets reactive magnetron sputtered vanadium oxide thin films at 300-360°C for 1-3h. X-ray diffraction shows the vanadium dioxide thin film was obtained annealed at 300°C for 1h, and the structure changed from monoclinic to tetragonal rutile VO2 at around 54°C. X-ray photoelectron spectroscopy and Fourier transform infrared spectroscopy show that the structure of VOx film underwent the following transformation: amorphous structure = VO₂ (B) + VO₂ (M) - VO₂ (M)+VO₂ (R).

Citation Download Citation

Jiran Liang, Ming Hu, and Zhigang Liu "Effects of quick thermal oxidation annealing on structure of vanadium oxide thin films by direct current facing targets reactive magentron sputtering", Proc. SPIE 7127, Seventh International Symposium on Instrumentation and Control Technology: Sensors and Instruments, Computer Simulation, and Artificial Intelligence, 712724 (13 October 2008); https://doi.org/10.1117/12.806466

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