30 December 2008 SiO2/HfO2 multilayers: impact of process parameters and stack geometry on the optical and structural properties
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Abstract
We present a complete systematic study on the effect of assist beam energy on SiO2/HfO2 quarter wave stacks deposited by dual ion beam sputter (DIBS) deposition. Increasing assist beam energy results in lower surface roughness and reduced micro-crystallinity. The coatings also show reduced mechanical stress. The improvements in the structural properties are accompanied by a reduction in the absorption loss and an increase in the laser resistance to damage at 1 μm.
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D. Patel, P. Langston, A. Markosyan, E. M. Krous, B. Langdon, F. Furch, B. Reagan, R. Route, M. M. Fejer, J. J Rocca, C. S. Menoni, "SiO2/HfO2 multilayers: impact of process parameters and stack geometry on the optical and structural properties", Proc. SPIE 7132, Laser-Induced Damage in Optical Materials: 2008, 71320L (30 December 2008); doi: 10.1117/12.804434; https://doi.org/10.1117/12.804434
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