353 nm high fluence irradiation of fused silica

Alfons Burkert; Ute Natura

doi:10.1117/12.804474

30 December 2008 353nm high-fluence irradiation of fused silica

Alfons Burkert, Ute Natura

Proceedings Volume 7132, Laser-Induced Damage in Optical Materials: 2008; 71321Q (2008) https://doi.org/10.1117/12.804474
Event: Boulder Damage Symposium XL Annual Symposium on Optical Materials for High Power Lasers, 2008, Boulder, Colorado, United States

Abstract

Fused Silica is one of the key materials for 193 nm and 248 nm lithography as well as Laser Fusion experiments (355nm windows) and is used for laser optics, beam delivery system optics and stepper/scanner optics for different wavelengths including excimer laser wavelengths 193 nm / 248 nm / 353nm. Rising energy densities per pulse and higher repetition rates will lead to decreasing exposure times in the future. The radiation induced defect generation of Lithosil® at wavelength 248 nm and 193 nm is well described [1,2]. The lifetime of Fused Silica at high fluence irradiation at 193 nm and 248 nm is limited by compaction and microchannel generation [3]. Short time tests well established for characterization of laser radiation induced defect generation in Lithosil® at irradiation wavelengths 193 nm and 248 nm were transferred to 353 nm laser irradiation experiments. Within these short time tests initial and radiation induced absorption as well as the measurement of laser induced fluorescence (LIF) are adequate methods to characterize the material under laser irradiation. Transmission and LIF measurements before and after high energy irradiation were performed to reveal the applicability of different grades of Lithosil® for 353 nm laser applications.

Citation Download Citation

Alfons Burkert and Ute Natura "353nm high-fluence irradiation of fused silica", Proc. SPIE 7132, Laser-Induced Damage in Optical Materials: 2008, 71321Q (30 December 2008); https://doi.org/10.1117/12.804474

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