12 January 2009 Dimensional nanometrology at the National Physical Laboratory
Author Affiliations +
Proceedings Volume 7133, Fifth International Symposium on Instrumentation Science and Technology; 713345 (2009) https://doi.org/10.1117/12.807994
Event: International Symposium on Instrumentation Science and Technology, 2008, Shenyang, China
Abstract
The growth in nanotechnology has led to an increased requirement for traceable dimensional measurements of nanometre-sized objects and micrometre-sized objects with nanometre tolerances. To meet this challenge NPL has developed both purpose built instrumentation and added metrology to commercially available equipment. This paper describes the development and use of a selection of these instruments that include: atomic force microscopy, x-ray interferometry, a low force balance, a micro coordinate measuring machine and an areal surface texture measuring instrument.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Andrew Yacoot, Andrew Yacoot, Richard Leach, Richard Leach, Ben Hughes, Ben Hughes, Claudiu Giusca, Claudiu Giusca, Christopher Jones, Christopher Jones, Alan Wilson, Alan Wilson, } "Dimensional nanometrology at the National Physical Laboratory", Proc. SPIE 7133, Fifth International Symposium on Instrumentation Science and Technology, 713345 (12 January 2009); doi: 10.1117/12.807994; https://doi.org/10.1117/12.807994
PROCEEDINGS
6 PAGES


SHARE
Back to Top