Total internal reflection type echelle grating demultiplexer based on amorphous silicon nanowire platform

Ning Zhu; Jun Song; Lech Wosinski; Sailing He

doi:10.1117/12.802558

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11 November 2008 Total internal reflection type echelle grating demultiplexer based on amorphous silicon nanowire platform

Ning Zhu, Jun Song, Lech Wosinski, Sailing He

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Proceedings Volume 7134, Passive Components and Fiber-based Devices V; 71340V (2008) https://doi.org/10.1117/12.802558
Event: Asia-Pacific Optical Communications, 2008, Hangzhou, China

Abstract

In this paper we present measurement results of an ultracompact echelle-grating demultiplexer based on silicon-on-insulator nanowire platform, in which we introduced a total internal reflection design of the grating facets to improve the diffraction efficiency. An average increase of the diffraction efficiency with 3.7dB is observed for the 3 channels compared to a normal design.

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Ning Zhu, Jun Song, Lech Wosinski, and Sailing He "Total internal reflection type echelle grating demultiplexer based on amorphous silicon nanowire platform", Proc. SPIE 7134, Passive Components and Fiber-based Devices V, 71340V (11 November 2008); https://doi.org/10.1117/12.802558

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