Translator Disclaimer
Paper
11 November 2008 Total internal reflection type echelle grating demultiplexer based on amorphous silicon nanowire platform
Author Affiliations +
Proceedings Volume 7134, Passive Components and Fiber-based Devices V; 71340V (2008) https://doi.org/10.1117/12.802558
Event: Asia-Pacific Optical Communications, 2008, Hangzhou, China
Abstract
In this paper we present measurement results of an ultracompact echelle-grating demultiplexer based on silicon-on-insulator nanowire platform, in which we introduced a total internal reflection design of the grating facets to improve the diffraction efficiency. An average increase of the diffraction efficiency with 3.7dB is observed for the 3 channels compared to a normal design.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ning Zhu, Jun Song, Lech Wosinski, and Sailing He "Total internal reflection type echelle grating demultiplexer based on amorphous silicon nanowire platform", Proc. SPIE 7134, Passive Components and Fiber-based Devices V, 71340V (11 November 2008); https://doi.org/10.1117/12.802558
PROCEEDINGS
9 PAGES


SHARE
Advertisement
Advertisement
Back to Top