Paper
18 November 2008 Structural and optical characterization of photonics structures prepared by nanoimprint technology
Daniel Hasko, Jaroslav Kovác, Alexander Satka, Milan Drzík, Frantisek Uherek, Graham Hubbard, Duncan W. E. Allsopp
Author Affiliations +
Proceedings Volume 7138, Photonics, Devices, and Systems IV; 713824 (2008) https://doi.org/10.1117/12.818074
Event: Photonics, Devices, and Systems IV, 2008, Prague, Czech Republic
Abstract
Nanoimprinting provides an alternative approach for production of highly ordered arrays of nanostructures on a wafer scale cheaply and rapidly. Disposable master technology is a promising method for creating large-area sub-wavelength photonic elements, solar cells and PhC structures. The geometrical parameters of the surface profile of disposable master samples and its replicas in the nanometer scale can be determined by applying standard methodology of the surface morphology measurement by AFM or SEM. Systematic studies will be focused on the process control for pattern transfer into different types of resist and its homogeneity on Si wafers. In particular, using a single spent polymer mold, imprint results shows, that the conditions for spin coating and curing the resist determine the homogeneity and replication fidelity that can be achieved. To analyze structures over large areas the above techniques can be used for statistical sampling. In addition, the general uniformity of the materials will be assessed using large-scale optical techniques. For the visualization and testing of structure pattern homogeneity as well as the pattern defects identification a large field diffraction-based diagnostic method has been utilized. The results indicate that choice of processing conditions is, in addition to materials selections, extremely important in achieving high-fidelity nanostructures.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Daniel Hasko, Jaroslav Kovác, Alexander Satka, Milan Drzík, Frantisek Uherek, Graham Hubbard, and Duncan W. E. Allsopp "Structural and optical characterization of photonics structures prepared by nanoimprint technology", Proc. SPIE 7138, Photonics, Devices, and Systems IV, 713824 (18 November 2008); https://doi.org/10.1117/12.818074
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Cited by 2 scholarly publications.
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KEYWORDS
Photoresist materials

Semiconducting wafers

Eye

Diffraction

Photonics

Nanostructures

Silicon

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