4 December 2008 Methodology of flare modeling and compensation in EUVL
Author Affiliations +
Proceedings Volume 7140, Lithography Asia 2008; 714009 (2008) https://doi.org/10.1117/12.804673
Event: SPIE Lithography Asia - Taiwan, 2008, Taipei, Taiwan
Flare in EUV mirror optics has been reported to be very high and long range effect due to its character which is inversely proportional to the 4th order of wavelength. The high level of flare will generate CD (Critical Dimension) variation problem in the area where the gradient of aerial pattern density is large while the long range influencing character would confront an issue of computational challenge either for OPC (Optical Proximity Correction) modeling or for any other practical ways to accommodate such a long range effect. There also exists another substantial challenge of measuring and characterizing such a long range flare accurately enough so that the characterized flare can successfully be used for the compensation in the standard OPC flow.
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Insung Kim, Insung Kim, Hoyoung Kang, Hoyoung Kang, Changmin Park, Changmin Park, Joo-On Park, Joo-On Park, Jeonghoon Lee, Jeonghoon Lee, Jinhong Park, Jinhong Park, Doohoon Goo, Doohoon Goo, Jeongho Yeo, Jeongho Yeo, Seong-Woon Choi, Seong-Woon Choi, Woosung Han, Woosung Han, } "Methodology of flare modeling and compensation in EUVL", Proc. SPIE 7140, Lithography Asia 2008, 714009 (4 December 2008); doi: 10.1117/12.804673; https://doi.org/10.1117/12.804673

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