1 December 2008 Optimizing integrated optical CD monitoring by floating pre-process variations in a complex multi-layer structure
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Proceedings Volume 7140, Lithography Asia 2008; 71400G (2008) https://doi.org/10.1117/12.804636
Event: SPIE Lithography Asia - Taiwan, 2008, Taipei, Taiwan
Abstract
Historically, in a volume production environment, process induced variation in optical property (n&k) of film stack was not significant for the most of applications using scatterometry. Many papers presented before addressed the CD variation in the production by adopting the fixed optical property approach [1-8]. However, with shrinkage of device size, and introduction of new material and process, n&k variation of some critical layers can not be ignored. In this paper, it presents impacts on measured optical CD due to n&k variation of one critical film in a 70nm DRAM ArF lithography process at a patterned area (A-layer). A solution to minimize the impacts using floating n&k in the scatterometry model is discussed, developed and verified.
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Marlene Strobl, Marlene Strobl, Lisa Huang, Lisa Huang, Allen Li, Allen Li, Ying Luo, Ying Luo, Youxian Wen, Youxian Wen, } "Optimizing integrated optical CD monitoring by floating pre-process variations in a complex multi-layer structure", Proc. SPIE 7140, Lithography Asia 2008, 71400G (1 December 2008); doi: 10.1117/12.804636; https://doi.org/10.1117/12.804636
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