1 December 2008 A comprehensive look at a new metrology technique to support the needs of lithography performance in near future
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Proceedings Volume 7140, Lithography Asia 2008; 71400N (2008) https://doi.org/10.1117/12.807998
Event: SPIE Lithography Asia - Taiwan, 2008, Taipei, Taiwan
Abstract
Need for accuracy, precision, speed and sophistication in metrology has increased tremendously over the past few years. Lithography performance will increasingly depend on post patterning metrology and this dependency will be heavily accelerated by technology shrinkage. These requirements will soon become so stringent that the current metrology capabilities may not be sufficient to support these near future needs. Accuracy and precision requirements approaching well into sub-nanometer range while the demand for increase in sampling also continues, triggering the need for a new technology in this area. In this technical presentation the authors would like to evaluate such technology that has the potential to support the future needs. Extensive data collection and tests are ongoing for both CD and overlay. Data on first order diffraction based overlay shows unprecedented measurement precision. The levels of precision are so low that for evaluation special methods has been developed and tested. In this paper overlay measurement method and data will be discussed, as well as applicability for future nodes and novel lithography techniques. CD data will be reported in the future technical publications.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jimmy Hu, Jimmy Hu, Chih-Ming Ke, Chih-Ming Ke, Willie Wang, Willie Wang, Jacky Huang, Jacky Huang, H. L. Chung, H. L. Chung, C. R. Liang, C. R. Liang, Victor Shih, Victor Shih, H. H. Liu, H. H. Liu, H. J. Lee, H. J. Lee, L. G. Terng, L. G. Terng, Y. D. Fan, Y. D. Fan, Maurits van der Schaar, Maurits van der Schaar, Kiwi Yuan, Kiwi Yuan, Vivien Wang, Vivien Wang, Cathy Wang, Cathy Wang, Mir Shahrjerdy, Mir Shahrjerdy, Andreas Fuchs, Andreas Fuchs, Kaustuve Bhattacharyya, Kaustuve Bhattacharyya, Karel van der Mast, Karel van der Mast, } "A comprehensive look at a new metrology technique to support the needs of lithography performance in near future", Proc. SPIE 7140, Lithography Asia 2008, 71400N (1 December 2008); doi: 10.1117/12.807998; https://doi.org/10.1117/12.807998
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