4 December 2008 Orientation Zernike Polynomials: a systematic description of polarized imaging using high NA lithography lenses
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Proceedings Volume 7140, Lithography Asia 2008; 714018 (2008) https://doi.org/10.1117/12.805438
Event: SPIE Lithography Asia - Taiwan, 2008, Taipei, Taiwan
Abstract
We introduce the 'Orientation Zernike Polynomials', a base function representation of retardation and diattenuation which are most relevant for vector imaging. We show that the 'Orientation Zernike Polynomials' provide a complete and systematic description of vector imaging using high NA lithography lenses and, hence, a basis for an in depth understanding of both polarized and unpolarized imaging, and its modeling.
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Tilmann Heil, Tilmann Heil, Johannes Ruoff, Johannes Ruoff, Jens Timo Neumann, Jens Timo Neumann, Michael Totzeck, Michael Totzeck, Daniel Krähmer, Daniel Krähmer, Bernd Geh, Bernd Geh, Paul Gräupner, Paul Gräupner, } "Orientation Zernike Polynomials: a systematic description of polarized imaging using high NA lithography lenses", Proc. SPIE 7140, Lithography Asia 2008, 714018 (4 December 2008); doi: 10.1117/12.805438; https://doi.org/10.1117/12.805438
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