4 December 2008 Status of DPP EUV sources development for Beta/HVM
Author Affiliations +
Proceedings Volume 7140, Lithography Asia 2008; 71401F (2008) https://doi.org/10.1117/12.804687
Event: SPIE Lithography Asia - Taiwan, 2008, Taipei, Taiwan
XTREME technologies and Philips EUV have provided the majority of available EUV sources based on Discharge Produced Plasma (DPP) technology worldwide since 2003. The fact that all existing prototype scanners make use of DPP sources and that further power scaling and debris mitigation upgrades are made according to plan clearly contributes to the maturity of this technology. We will present the latest status of our tin based DPP sources in the joint development work of XTREME technologies and Philips EUV. Demonstration experiments pave the way for this technology towards the HVM power level.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Masaki Yoshioka, Peter Zink, Guido Schriever, Marc Corthout, "Status of DPP EUV sources development for Beta/HVM", Proc. SPIE 7140, Lithography Asia 2008, 71401F (4 December 2008); doi: 10.1117/12.804687; https://doi.org/10.1117/12.804687


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