4 December 2008 Development of photosensitive silsesquioxane
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Proceedings Volume 7140, Lithography Asia 2008; 71402O (2008) https://doi.org/10.1117/12.804669
Event: SPIE Lithography Asia - Taiwan, 2008, Taipei, Taiwan
Abstract
We succeeded in development of SOG materials comprised of cage-type phenyl silsesquioxanes (PSQ) and their alkali soluble derivatives. The alkali soluble silsesquioxane (APSQ) can provide both positive and negative tone photosensitive SOG combination with diazo naphtoquinone (DNQ) and photo-base (acid) agent, respectively. Here we present feature of photolithography process and film properties for our SOG materials.
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Yuji Tashiro, Yuji Tashiro, Takeshi Sekito, Takeshi Sekito, Takafumi Iwata, Takafumi Iwata, Daishi Yokoyama, Daishi Yokoyama, Toshiaki Nonaka, Toshiaki Nonaka, } "Development of photosensitive silsesquioxane", Proc. SPIE 7140, Lithography Asia 2008, 71402O (4 December 2008); doi: 10.1117/12.804669; https://doi.org/10.1117/12.804669
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