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4 December 2008 A technique for rapid elimination of microbubbles for photochemical filter startup
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Proceedings Volume 7140, Lithography Asia 2008; 71402Y (2008) https://doi.org/10.1117/12.804691
Event: SPIE Lithography Asia - Taiwan, 2008, Taipei, Taiwan
Abstract
In semiconductor manufacturing processes, bubbles (often referred as microbubbles) can be contaminants that reduce manufacturing yield. In photolithography processes, a Point-of-Use filter is used on a clean track system to ensure lower wafer defect level by providing particle and bubble free photochemicals. However, filter changeout often results in significant chemical consumption and tool downtime due to purging of air from the system. This paper describes a technique developed to rapidly eliminate microbubbles during filter startup in a two stage dispense system. The experimental results suggest that by providing a constant pressure to the fluid after wetting the filter, we were able to effectively eliminate microbubbles in the fluid. Therefore, the filter startup process was significantly improved.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Aiwen Wu and Wailup Chow "A technique for rapid elimination of microbubbles for photochemical filter startup", Proc. SPIE 7140, Lithography Asia 2008, 71402Y (4 December 2008); https://doi.org/10.1117/12.804691
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