4 December 2008 The first on-site evaluation of a new filter optimized for TARC and developer
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Proceedings Volume 7140, Lithography Asia 2008; 71402Z (2008) https://doi.org/10.1117/12.804672
Event: SPIE Lithography Asia - Taiwan, 2008, Taipei, Taiwan
Abstract
In previous studies, we identified filter properties that have a strong effect on microbubble formation on the downstream side of the filter membrane. A new Highly Asymmetric Polyarylsulfone (HAPAS) filter was developed based on the findings. In the current study, we evaluated newly-developed HAPAS filter in environmentally preferred non-PFOS TARC in a laboratory setting. Test results confirmed that microbubble counts downstream of the filter were lower than those of a conventional HDPE filter. Further testing in a manufacturing environment confirmed that HAPAS filtration of TARC at point of use was able to reduce defectivity caused by microbubbles on both unpatterned and patterned wafers, compared with a HDPE filter.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Toru Umeda, Takeo Ishibashi, Atsushi Nakamura, Junichi Ide, Masaru Nagano, Koichi Omura, Shuichi Tsuzuki, Toru Numaguchi, "The first on-site evaluation of a new filter optimized for TARC and developer", Proc. SPIE 7140, Lithography Asia 2008, 71402Z (4 December 2008); doi: 10.1117/12.804672; https://doi.org/10.1117/12.804672
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