4 December 2008 The noble resists composed of cationic and anionic polymerizable PAGs
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Proceedings Volume 7140, Lithography Asia 2008; 714031 (2008) https://doi.org/10.1117/12.804631
Event: SPIE Lithography Asia - Taiwan, 2008, Taipei, Taiwan
Abstract
A recent new class of resists referred to as polymer-bound PAG resists, which have slightly increased PAG loading and reduced photo acid diffusion relative to tranditional blended CAR systems have shown promise in improving resolution, faster photospeed, higher stablility and LER. we have developed two kinds of PAG, which are cationic and anionic polymerizable PAGs. One is that the polymer backbone is directly connected with cationic part in PAG and the other is that the polymer backbone is directly connected with anionic part in PAG. In this study we described the synthetic process of polymerizable PAGs and the polymerization process to make PAG-bound polymers and then, the lithography properties of resists composed of PAG-bound polymer were reffed to.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jung Hoon Oh, Jung Hoon Oh, Dong Chul Seo, Dong Chul Seo, Hyun Sang Joo, Hyun Sang Joo, Sung Do Jung, Sung Do Jung, Jin Ho Kim, Jin Ho Kim, Seung Jae Lee, Seung Jae Lee, Ran Ra Park, Ran Ra Park, JoonHee Han, JoonHee Han, Joo Hyeon Park, Joo Hyeon Park, } "The noble resists composed of cationic and anionic polymerizable PAGs", Proc. SPIE 7140, Lithography Asia 2008, 714031 (4 December 2008); doi: 10.1117/12.804631; https://doi.org/10.1117/12.804631
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