3 October 2008 Precision optical metrology for MEMSm
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Proceedings Volume 7155, Ninth International Symposium on Laser Metrology; 71551S (2008) https://doi.org/10.1117/12.814565
Event: Ninth International Symposium on Laser Metrology, 2008, Singapore, Singapore
Continued advances in emerging technology of microelectromechanical systems (MEMS) and other microsystems of current interest require specialized design, analysis, fabrication, and characterization capabilities. Metrology is an inseparable part of the characterization. Recent advances in the field of optical holography make it particularly suitable for precision metrology of MEMS, especially as it relates to determination of operational characteristics of systems produced, to enable verification of their operation as well as refinement and optimization of the specific designs. This paper describes an optical metrology for measurement of MEMS and illustrates its use with representative examples of MEMS functioning at high frequencies while operating in demanding environments. This precision metrology facilitates characterization of dynamic and thermomechanical behavior of the individual components, their packages, and other complex material structures. Representative results presented herein indicate that the optical metrology is a viable tool for precision microscale measurements and, as such, it is particularly useful for development of MEMS, especially while considering MEMS reliability assessment.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ryszard J. Pryputniewicz, Ryszard J. Pryputniewicz, } "Precision optical metrology for MEMSm", Proc. SPIE 7155, Ninth International Symposium on Laser Metrology, 71551S (3 October 2008); doi: 10.1117/12.814565; https://doi.org/10.1117/12.814565


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