High aspect ratio grating fabrication in SU-8 resist by UV-curing nanoimprint

Xudi Wang; Liangjin Ge; Jingjing Lu; Shaojun Fu

doi:10.1117/12.807006

2 February 2009 High aspect ratio grating fabrication in SU-8 resist by UV-Curing nanoimprint

Xudi Wang, Liangjin Ge, Jingjing Lu, Shaojun Fu

Author Affiliations +

Proceedings Volume 7159, 2008 International Conference on Optical Instruments and Technology: MEMS/NEMS Technology and Applications; 71590K (2009) https://doi.org/10.1117/12.807006
Event: International Conference of Optical Instrument and Technology, 2008, Beijing, China

Abstract

UV curing nanoimprint is demonstrated for high aspect ratio gratings fabrication based on SU-8 for nanophotonics and biochemical applications. The defects, which are caused by stress and friction between mold and resist and air bubbles are key issues. To eliminate the defects, the process parameters, such as imprinting pressure, baking time and demolding temperature, are optimized. SU-8 grating with 150nm in width and 1.5µm is presented with good uniformity in large area using Si template fabricated by non-switching DRIE process. The process could find broader applications in the manufacture of biochemical devices and nanophotonic structures.

Citation Download Citation

Xudi Wang, Liangjin Ge, Jingjing Lu, and Shaojun Fu "High aspect ratio grating fabrication in SU-8 resist by UV-Curing nanoimprint", Proc. SPIE 7159, 2008 International Conference on Optical Instruments and Technology: MEMS/NEMS Technology and Applications, 71590K (2 February 2009); https://doi.org/10.1117/12.807006

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