13 February 2009 High-resolution wavefront correction in multiphoton microscopy
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A system for making wavefront corrections for use in multiphoton microscopy has been constructed. Corrections are made using a high-resolution nematic liquid crystal device which has a phase stroke of 2π. The device has a design wavelength of 1064 nm. A simple way for setting the device up for lower wavelengths (here 800 nm) is presented. It was found that the device has an undesired zero-order diffraction component of 30%. A scheme for filtering this portion out is presented and it was demonstrated that this can eliminate the component completely. The device was used to optically simulate a thin lens with a specified focal length, which was found to match within error bounds. Finally the modulator was used to compensate for a mechanical defocus that was applied intentionally.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
G. Hall, M. Ren, W. B. Amos, K. W. Eliceiri, J. G. White, "High-resolution wavefront correction in multiphoton microscopy", Proc. SPIE 7183, Multiphoton Microscopy in the Biomedical Sciences IX, 71832C (13 February 2009); doi: 10.1117/12.807779; https://doi.org/10.1117/12.807779

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