13 February 2009 High-resolution wavefront correction in multiphoton microscopy
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A system for making wavefront corrections for use in multiphoton microscopy has been constructed. Corrections are made using a high-resolution nematic liquid crystal device which has a phase stroke of 2π. The device has a design wavelength of 1064 nm. A simple way for setting the device up for lower wavelengths (here 800 nm) is presented. It was found that the device has an undesired zero-order diffraction component of 30%. A scheme for filtering this portion out is presented and it was demonstrated that this can eliminate the component completely. The device was used to optically simulate a thin lens with a specified focal length, which was found to match within error bounds. Finally the modulator was used to compensate for a mechanical defocus that was applied intentionally.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
G. Hall, G. Hall, M. Ren, M. Ren, W. B. Amos, W. B. Amos, K. W. Eliceiri, K. W. Eliceiri, J. G. White, J. G. White, } "High-resolution wavefront correction in multiphoton microscopy", Proc. SPIE 7183, Multiphoton Microscopy in the Biomedical Sciences IX, 71832C (13 February 2009); doi: 10.1117/12.807779; https://doi.org/10.1117/12.807779

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