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5 March 2009 Comparison of ns and ps pulses for Si and glass micromachining applications
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Abstract
Demand for higher precision, clean laser based processes has driven the development of picosecond pulse width lasers that operate at high frequency with high average powers. Industries like microelectronics and LCD manufacturing are gearing up for the next generation of devices that demand tighter densities, better electrical efficiency, higher speed and better quality. We focus here on the differences between processing with nanosecond and picosecond pulses on Silicon and on alumino-borosilicate glass.
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Stephen Lee, Allan Ashmead, and Leonard Migliore "Comparison of ns and ps pulses for Si and glass micromachining applications", Proc. SPIE 7193, Solid State Lasers XVIII: Technology and Devices, 719322 (5 March 2009); https://doi.org/10.1117/12.811064
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