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19 February 2009 OFI rare-gas excimer amplifier for high-intensity VUV pulse generation
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We have demonstrated an argon excimer vacuum ultraviolet (VUV) amplifier at 126 nm by using the optical-field induced ionization (OFI) of argon. The gain-length product of 5.6 was achieved as a result of the optical feedback inside the amplifier with a VUV mirror. Plasma self-channeling caused by the high-intensity pump laser was simultaneously observed when the maximum gain-length product was observed. We have also optimized the output power of a subpicosecond VUV seed beam at 126 nm produced in low-pressure rare-gases as a result of the seventh harmonic nonlinear wavelength conversion of a Ti:Sapphire laser at 882 nm.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Masahito Katto, Masanori Kaku, Kazuyoshi Oda, Tadashi Kamikihara, Atsushi Yokotani, Shoichi Kubodera, Noriaki Miyanaga, and Kunioki Mima "OFI rare-gas excimer amplifier for high-intensity VUV pulse generation", Proc. SPIE 7196, High Energy/Average Power Lasers and Intense Beam Applications III, 71960L (19 February 2009);

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