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19 February 2009 OFI rare-gas excimer amplifier for high-intensity VUV pulse generation
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Abstract
We have demonstrated an argon excimer vacuum ultraviolet (VUV) amplifier at 126 nm by using the optical-field induced ionization (OFI) of argon. The gain-length product of 5.6 was achieved as a result of the optical feedback inside the amplifier with a VUV mirror. Plasma self-channeling caused by the high-intensity pump laser was simultaneously observed when the maximum gain-length product was observed. We have also optimized the output power of a subpicosecond VUV seed beam at 126 nm produced in low-pressure rare-gases as a result of the seventh harmonic nonlinear wavelength conversion of a Ti:Sapphire laser at 882 nm.
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Masahito Katto, Masanori Kaku, Kazuyoshi Oda, Tadashi Kamikihara, Atsushi Yokotani, Shoichi Kubodera, Noriaki Miyanaga, and Kunioki Mima "OFI rare-gas excimer amplifier for high-intensity VUV pulse generation", Proc. SPIE 7196, High Energy/Average Power Lasers and Intense Beam Applications III, 71960L (19 February 2009); https://doi.org/10.1117/12.807339
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