24 February 2009 Fabrication of nanostructured ITO thin films on nanoimprinted glasses by pulsed laser deposition
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Abstract
We fabricated indium tin oxide (ITO) thin films on nanoimprinted glass substrates using pulsed laser deposition (PLD). The nanoimprinted glass substrate was prepared by thermal nanoimprint using an atomically stepped sapphire (α-Al2O3 single crystal) mold. Two kinds of sapphire molds were employed, one with a single step about 0.2 nm high and the other with a bunched step about 2 nm high. The surface morphology of the stepped sapphire mold was successfully transferred to the glass surface in an atomic scale. The nanoimprinted glass had a regular nanostepped pattern; one had a step height of about 0.2 nm and step separation of about 100 nm, the other had a step height of about 2 nm and step separation of about 1 μm. The ITO films were deposited at room-temperature (RT) or 200°C on the nanoimprinted glass substrates and on the non-patterned commercial glass for comparison. The ITO films deposited at RT were post-annealed for further crystallization. The surface of the ITO thin films deposited on the nanoimprinted glass well reflected the nanopattern of the glass substrate surface. Preferential crystalline orientation of the ITO thin films was achieved on the nanoimprinted glass substrates. The resistivity of ITO thin films deposited on the nanoimprinted glass was lower than that on the commercial glass, which was probably due to the higher crystal orientation of the films grown on the nanoimprinted glass surfaces.
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Yasuyuki Akita, Yasuyuki Akita, Yuki Sugimoto, Yuki Sugimoto, Masahiro Mita, Masahiro Mita, Hideo Oi, Hideo Oi, Osami Sakata, Osami Sakata, Mamoru Yoshimoto, Mamoru Yoshimoto, } "Fabrication of nanostructured ITO thin films on nanoimprinted glasses by pulsed laser deposition", Proc. SPIE 7201, Laser Applications in Microelectronic and Optoelectronic Manufacturing VII, 72011A (24 February 2009); doi: 10.1117/12.808096; https://doi.org/10.1117/12.808096
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