24 February 2009 Large-area plasmonic structures fabricated by laser nanopatterning and their applications
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Abstract
Laser interference lithography is applied to fabricate large-area plasmonic nanostructures. This approach has the advantages of being non-contact process in air and able to achieve large-area and maskless nanolithography at a high speed with low system investment. Single layer Au or Ag noble metallic thin film and Ag/Au, Ag/Ni or Au/Ni bimetallic layer thin films are patterned into nano-dot, nano-rod and nano-nut arrays by laser interference lithography. Plasmonic effects of the fabricated metallic nanostructures are studied. Tunable and multi-peak surface plasmon resonances of these nanostructures can be obtained, which have potential applications in solar cells, bio-sensing and photonic circuits.
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M. H. Hong, M. H. Hong, C. H. Liu, C. H. Liu, F. Ma, F. Ma, Z. C. Chen, Z. C. Chen, B. Luk'yanchuk, B. Luk'yanchuk, L. P. Shi, L. P. Shi, T. C. Chong, T. C. Chong, } "Large-area plasmonic structures fabricated by laser nanopatterning and their applications", Proc. SPIE 7202, Laser-based Micro- and Nanopackaging and Assembly III, 72020K (24 February 2009); doi: 10.1117/12.810460; https://doi.org/10.1117/12.810460
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