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24 February 2009 Large-area plasmonic structures fabricated by laser nanopatterning and their applications
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Laser interference lithography is applied to fabricate large-area plasmonic nanostructures. This approach has the advantages of being non-contact process in air and able to achieve large-area and maskless nanolithography at a high speed with low system investment. Single layer Au or Ag noble metallic thin film and Ag/Au, Ag/Ni or Au/Ni bimetallic layer thin films are patterned into nano-dot, nano-rod and nano-nut arrays by laser interference lithography. Plasmonic effects of the fabricated metallic nanostructures are studied. Tunable and multi-peak surface plasmon resonances of these nanostructures can be obtained, which have potential applications in solar cells, bio-sensing and photonic circuits.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
M. H. Hong, C. H. Liu, F. Ma, Z. C. Chen, B. Luk'yanchuk, L. P. Shi, and T. C. Chong "Large-area plasmonic structures fabricated by laser nanopatterning and their applications", Proc. SPIE 7202, Laser-based Micro- and Nanopackaging and Assembly III, 72020K (24 February 2009);

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