23 February 2009 Polymeric nanosieves fabricated by UV lithography
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Abstract
Sieves are membranes with a regular array of uniform pores that present low flow resistance. Because of such characteristics they are promising devices for filtration, separation of particles by size and drug delivery control. If the pore dimensions reach the scale of nanometers, new and exciting biological applications may be developed. We propose and demonstrated a technique for fabrication of polymeric sieves using only soft lithography that allows the mass production of sieves with pores in the scale of hundred of nanometers. The technique associates UV interference lithography, conventional optical lithography and molding. The process starts with the UV interference lithography in a thin SU-8 photoresist film, in order to record the small pores. After development, a thick SU-8 layer is coated, on the previously recorded sample, in order to pattern a hexagonal sustaining structure. The structures recorded in SU-8 are used to create a negative mold in PDMS (Polydimethylsiloxane) that is used for casting the sieve in PLLA (poly-Llactide).
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Luis Gutierrez-Rivera, Luis Gutierrez-Rivera, Lucila Cescato, Lucila Cescato, } "Polymeric nanosieves fabricated by UV lithography", Proc. SPIE 7204, Micromachining and Microfabrication Process Technology XIV, 72040N (23 February 2009); doi: 10.1117/12.808601; https://doi.org/10.1117/12.808601
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